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Global Atomic Layer Deposition (ALD) Equipment Market 2017 – ASM International N.V., Cambridge NanoTech Inc, Novellus Systems Inc., Tokyo Electron Ltd

Global Atomic Layer Deposition (ALD) Equipment Market 2017
Atomic Layer Deposition Equipment Market (By Type: Metal ALD, Aluminum Oxide ALD, ALD on Polymers, Catalytic ALD, and others; By Application: Research & Development Facilities and Semiconductor & Electronics; By Geography: North America, Europe, Asia-Pacific, and RoW) Global Scenario, Market Size, Outlook, Trend and Forecast, 2015-2024

Global Atomic Layer Deposition (ALD) Equipment Market is estimated to reach $8,059 million by 2024; growing at a CAGR of 29.1% from 2016 to 2024. Atomic layer deposition (ALD) is a thin film deposition technique based on sequential use in gas phase process. ALD has gained popularity in the research and industrial applications, owing to its low deposition rate. It is used for producing nanofilms for various commercial sectors and mechanical devices such as microprinters, smartphones, videogames, DVD players, portable media players, and others. Rising demand for high end semiconductor devices and growth in research activity pose an increased demand for atomic layer deposition equipment.

The global atomic layer deposition equipment market is majorly driven by growth in application of rise in demand for ALD in medical and aerospace electronics field, ALD equipment in nanotechnology, and increase in demand for copper deposition equipment in memory devices. However, lack of skilled workforce and high cost of initial investment would act as a restraint for the market. Application of ALD in power devices, and energy storage systems would provide several growth opportunities for the market in the coming years.

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Type, application, and geography are the major segments of global ALD equipment market. Type segment includes Catalytic ALD, Metal ALD, ALD on Polymers, Aluminum Oxide ALD, and others. By application, the market is categorized into semiconductor & electronics, and research & development facilities. Aluminum Oxide ALD dominated the type segment followed by the metal ALD segment 2016, owing to its extensive usage in various applications such as dielectric layers, insulating layers, solar cell surface passivation, and others.

Geographically, the global ALD equipment market has been bifurcated into North America, Europe, Asia-Pacific and RoW. The U.S., Mexico and Canada are covered under North America wherein Europe covers UK, Italy, France, Germany, and others. Asia-Pacific covers China, India, Japan, Taiwan, South Korea, and others. Rest of the world covers South America, Middle East and Africa.

The Key players in the atomic layer deposition equipment market are ASM International N.V., Cambridge NanoTech Inc, Novellus Systems Inc., Tokyo Electron Ltd., Aixtron SE, Hitachi Kokusai Electric Inc., Ultratech Inc., Adeka Corp, Applied Materials Inc., and ATMI Inc., among others.

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The key takeaways from the report
The report will provide detailed analysis of Atomic Layer Deposition Equipment Market with respect to major segments such as type, and application
The report will include the qualitative and quantitative analysis with market estimation over 2015-2024 and compound annual growth rate (CAGR) between 2016 and 2024
Comprehensive analysis of market dynamics including factors and opportunities will be provided in the report
An exhaustive regional analysis of Atomic Layer Deposition Equipment Market has been included in the report
Profile of the key players in the Atomic Layer Deposition Equipment Market, will be provided, which include key financials, product & services, new developments and business strategies

Scope of Atomic Layer Deposition Equipment Market
Type Segments
Application Segments
Geographical Segments

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